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Ultra-flat thermal SiO2 wafers, 200nm, type <100> stock lenses and delicate instruments

SKU: 86348980390

4.1
SEK216.00 SEK237.00

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Ships within 48 hours · Estimated delivery Aug 25 - Aug 30

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Ultra-flat thermal SiO2 wafers, 200nm, type <100> stock lenses and delicate instrumentsThe Ultra Flat SiO2 substrates consist of a 200nm thermally grown amorphous SiO2 film on an ultra flat silicon wafer. SiO2 is one of the most characterised materials and is widely used in semiconductor manufacturing, thin film research and as substrate for growing cells. It can be directly used as substrate for AFM and SEM imaging. The ultra flat thermal silicon dioxide substrates are available in 6" wafer and conveniently diced 5 x 5mm, 5 x 7mm and

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Description

lenses and delicate instruments

using reliable

some particles can be missing or could have been on a different location

Needle tip

Ultra-flat thermal SiO2 wafers, 200nm, type <100> stock lenses and delicate instrumentsThe Ultra Flat SiO2 substrates consist of a 200nm thermally grown amorphous SiO2 film on an ultra flat silicon wafer. SiO2 is one of the most characterised materials and is widely used in semiconductor manufacturing, thin film research and as substrate for growing cells. It can be directly used as substrate for AFM and SEM imaging. The ultra flat thermal silicon dioxide substrates are available in 6" wafer and conveniently diced 5 x 5mm, 5 x 7mm and

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